Advanced Research Center for Nanolithography (ARCNL) 
Amsterdam, Netherlands İlan Özeti
The Advanced Research Center for Nanolithography (ARCNL) in Amsterdam is offering a full‑time PhD position in Lensless 3D optical imaging. The role focuses on developing high‑resolution volumetric imaging without conventional optics, using ptychography, structured illumination, and fiber‑based detection. Candidates will build experimental setups, optimize illumination, and create reconstruction algorithms with compressive sensing and machine learning. The project aims to produce a compact all‑fiber 3D imaging demonstrator for semiconductor metrology, collaborating with ASML. Applicants should hold an MSc in physics, optics, or a related field. The contract lasts four years, with a gross monthly salary of €3,115 and benefits including housing and visa support for international students.
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Proje Açıklaması
Work Activities
Computational optical imaging is a powerful tool to recover object structure from diffraction patterns without relying on conventional high-quality optics and microscope objectives. While many lensless approaches already work well for 2D imaging, achieving high-resolution volumetric reconstruction of complex structures in compact fiber-based format remains a major challenge.
In this project you will push the boundaries of optical microscopy and develop new approaches for 3D lensless imaging based on ptychography, structured illumination, fiber-based detection and physics-informed computational reconstruction. The work will combine optical experiments with algorithm development. On the experimental side, you will build and optimize ptychography setups using visible light, spatial light modulators, and multimode fibers. You will investigate optimized illumination and detection schemes that maximize information content and imaging performance. On the computational side, you will develop reconstruction algorithms based on compressive sensing and data-driven machine learning approaches for depth-resolved 3D imaging. You will exploit the diversity provided by structured speckle illumination together with sparsity priors to reconstruct complex optical fields and depth-dependent sample structure from a limited set of measurements.
The project includes the development of a compact all-fiber 3D imaging demonstrator aimed at applications in semiconductor metrology. You will therefore collaborate with ASML research on wafer metrology.
Qualifications
You have a MSc degree in physics, optics, photonics or a related field.
Work environment
ARCNL performs fundamental research, focusing on the physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. While the academic setting and research style are geared towards establishing scientific excellence, the topics in ARCNL’s research program are intimately connected with the interests of the industrial partner ASML. The institute is located at Amsterdam Science Park and currently employs about 100 persons of which 65 are ambitious (young) researchers from all over the globe. arcnl.nl
Working conditions
The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years, with a starting salary of gross € 3.115 per month and a range of employment benefits. After successful completion of the PhD research a PhD degree will be granted at a Dutch University. Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.
More information?
For further information about the position, please contact Lyuba Amitonova: l.amitonova@arcnl.nl
Application
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